Microscopy Equipment
Microscopy equipment available at the ISN is grouped into two broad categories. They are tools for:
- High Resolution Microscopy, and
- Visible Light Microscopy.
See the lists below for details on each piece of available equipment, arranged into these categories.
Please stay tuned for further updates to this page, including additional pieces of equipment on which the ISN offers training.
Microscopy — High Resolution
Zeiss Xradia 620 Versa 3D X-Ray Microscope
The Xradia 620 Versa, upgraded from an Xradia 520 Versa, provides non-destructive 3-D X-ray imaging at submicron resolution. The instrument features feature dual-stage magnification based on synchrotron-caliber optics and Zeiss' proprietary RaaD™ (Resolution at a Distance) technology for high resolution at large working distances, a vast improvement over traditional micro-computed tomography. Non-destructive imaging preserves and extends the use of samples, enabling 4D and in situ studies.It achieves 0.5 µm true spatial resolution with minimum achievable voxel 40 nm.
Applications span materials science, life sciences, and electronics.
To gain access to this instrument, click here to learn more the ISN access application process.
Oxford Instruments Asylum Research Jupiter XR AFM
The Jupiter XR is a large-sample AFM, providing higher resolution than other large-sample instruments with complete 200 mm sample access on a 210 mm stage. The instrument features the proprietary blueDrive™ Photothermal Excitation for Tapping Mode AFM imaging, providing high resolution and fast results through a gentle process that can measure topography and also mechanical, electrical, and magnetic properties of samples.
To gain access to this instrument, click here to learn more the ISN access application process.
Zeiss Sigma 300VP FE-SEM with EDS and CL Detection
The ISN's field emission scanning electron microscope is a Zeiss Sigma 300 VP Field Emission Scanning Electron Microscope.
The Zeiss Sigma 300 VP comprises a fully integrated in-lens detector for secondary electrons (SE) and an angle selective backscattered electron (HDAsB) detector. The Sigma 300 VP provides ultra-high resolution for both SE to image surface information and BSE to present compositional information in the high vacuum mode. A variable pressure (VP) mode is performed using nitrogen as imaging gas at pressures between 10 and 133 Pa. In this mode SE contrast is realized by the dedicated C2D detector and BSE contrast again by the HDAsB.
The Sigma 300 VP also features a large multi-port analytical chamber, a fully motorized 5-axes motorized eucentric stage, and high current mode.
The instrument has a resolution of 1.2 nm at 15 kV and 2.2 nm at 1 kV, accelerating voltage of 0.02–30 kV, and a probe current of 4 pA–20 nA (40–100 nA at high current). The eucentric stage offers -10°–90° tilt, 360° rotation, and positioning of 125 mm in the X/Y directions and 50 mm in the Z direction. Image processing resolution is up to a maximum of 3072 x 2304 pixels.
This instrument does not have an EDS detector installed.
This instrument includes a chamber plasma cleaner.
To gain access to this instrument, click here to learn more the ISN access application process.
JEOL 9320 FIB
The ISN's JEOL 9320 FIB is used primarily for the preparation of samples for inspection in other instruments, such as an SEM. It can prepare cross sections from local areas of STEM/TEM specimens for semiconductor failure analysis and achieves precise, fast milling for SEM cross sectional specimens.
It features high-speed milling with a large ion-beam current (30 kV, 30 nA or greater), significantly reducing rough-milling and rough-processing time compared to standard instruments. An improved ion optical system enables one to observe a high-resolution SIM image (6 nm, 30 kV) of a sample undergoing preparation.
To gain access to this instrument, click here to learn more the ISN access application process.
Keyence VK-X250 Laser Scanning Confocal Microscope
The VK-X Series 3D Laser Scanning Confocal Microscope provides non-destructive, non-contact, nanometer-level profile, roughness, and film thickness data on any material or shape, and indicates which metrics are most critical for evaluation.
Laser Scanning Confocal Microscopes are able to collect both optical images and surface data of a sample by combining white light with laser light.
The VK-X250 incorporates a 408 nm violet laser, provides greater than 28000x magnification, and features 0.5 nm resolution in height and 1 nm resolution in width.
To gain access to this instrument, click here to learn more the ISN access application process.
Nanonics Imaging MultiView 4000 NSOM
The ISN's near-field scanning optical microscopy (NSOM) instrument, also called a scanning near-field optical microscope (SNOM) instrument, provides an optical method to capture the near-field of light distribution and allows for all forms of optical imaging while correlating light distribution with topography.
NSOMs offer the ability to optically image objects or features with a resolution that is below the diffraction limit of conventional optical microscopes (i.e., <0.5x wavelength of the light used). They allow for all forms of optical imaging — absorption, reflection, collection and illumination — with a point source as small as 50nm.
The MultiView 4000 NSOM system is equipped with a 532nm continuous wave (CW) laser.
To gain access to this instrument, click here to learn more the ISN access application process.
JEOL 6010LA Scanning Electron Microscope (SEM)
The JEOL 6010LA is a multifunctional general-purpose SEM with a tungsten source and an integrated motorized stage. It is capable of 5nm resolution at 20kV.
Equipped with SEI and EDS detectors, it is an analytical SEM also capable of operating in low vacuum-mode from 10–85Pa to improve the imaging of charging samples and the observation of non-conductive materials without pre-treatment.
Note: JEOL 6010LA SEM users must reserve the sputter coater separately.
Microscopy — Visible Light
Zeiss Axioskop 2 Research Microscope
Zeiss Axioskop 2 MAT is an upright incident and transmitted light microscope configured for brightfield, darkfield, phase contrast, and fluorescence imaging. It is primarily designed for the inspection of materials (e.g., structure, particle, and surface analysis). It can be used for both general optical microscope applications or for observing samples with fluorescent light capabilities or polarized light capabilities. It features 50x–1000x magnification.
To gain access to this instrument, click here to learn more the ISN access application process.
Zeiss Axiovert 200 Inverted Fluorescence Microscope
The Zeiss Axiovert 200 is a motorized inverted microscope capable of transmitted light microscopy or fluorescence microscopy.
It provides the capabilities for the structure analysis, grain-size analysis, particle analysis, pore and crack testing, step-height measurement, surface analysis (roughness, smoothness) of observed samples.
To gain access to this instrument, click here to learn more the ISN access application process.
Zeiss Axioskop 2 Research Microscope
Zeiss Axioskop 2 MAT is an upright incident and transmitted light microscope configured for brightfield, darkfield, phase contrast, and fluorescence imaging. It is primarily designed for the inspection of materials (e.g., structure, particle, and surface analysis). It can be used for both general optical microscope applications or for observing samples with fluorescent light capabilities or polarized light capabilities. It features 50x–1000x magnification.
To gain access to this instrument, click here to learn more the ISN access application process.
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